Ultraviolet laser beam monitor using radiation responsive crystals
US4792690A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 21, 1987 |
| Grant date | Dec 20, 1988 |
| Priority date | — |
| Expiry date | Aug 21, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J1/58
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus and method for monitoring an ultraviolet laser beam includes disposing in the path of an ultraviolet laser beam a substantially transparent crystal that will produce a color pattern in response to ultraviolet radiation. The crystal is exposed to the ultraviolet laser beam and a color pattern is produced within the crystal corresponding to the laser beam intensity distribution therein. The crystal is then exposed to visible light, and the color pattern is observed by means of the visible light to determine the characteristics of the laser beam that passed through crystal. In this manner, a perpendicular cross sectional intensity profile and a longitudinal intensity profile of the ultraviolet laser beam may be determined. The observation of the color pattern may be made with forward or back scattered light and may be made with the naked eye or with optical systems such as microscopes and television cameras.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.