Method for measurement of impurities in liquids
US4794086A · kind A · utility
88Cited by
6References
11Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 25, 1985 |
| Grant date | Dec 27, 1988 |
| Priority date | — |
| Expiry date | Nov 25, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/25875
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Method and apparatus for the measurement of sub-ppm concentrations of impurities in liquids. The liquid to be measured for impurities is dispersed into uniform droplets of a precisely known diameter D in a gas stream, such as air, using for example, a vibratory orifice generator. The dispersed droplets evaporate in the gas stream to leave a residue particle having a diameter d, which can be measured for example by means of a laser light scattering spectrometer. The concentration by volume, C.sub.v, of the impurities can then be calculated according to the equation; C.sub.v =(d/D).sup.3.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.