Rear entry photodiode with three contacts
US4794439A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 19, 1987 |
| Grant date | Dec 27, 1988 |
| Priority date | — |
| Expiry date | Mar 19, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/544
Abstract
A semiconductor photodiode includes a substrate of semi-insulating indium phosphide having a first layer of highly doped P type indium phosphide on a surface thereof. An active second layer of N type indium gallium arsenide is on the first layer and a third layer of N type indium gallium arsenide or indium phosphide is on the second layer. The third layer may be entirely more highly doped than the second layer or may have a highly doped region on its surface. A first contact is on the third layer and a second contact is on the first layer. A buffer layer of lightly doped N or P type indium phosphide may be provided between the first layer and the second layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.