Laser pattern generation apparatus
US4796038A · kind A · utility
193Cited by
14References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 28, 1988 |
| Grant date | Jan 3, 1989 |
| Priority date | — |
| Expiry date | Mar 28, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/704
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A laser pattern generation apparatus particularly suited for semiconductor applications. The laser beam is split into a plurality of beams and modulated with acousto-optic modulators. A rotating mirror having a plurality of facets causes the beam to scan the workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.