Etched glass and process of manufacturing same
US4797316A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 4, 1987 |
| Grant date | Jan 10, 1989 |
| Priority date | — |
| Expiry date | Dec 4, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24595
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The invention relates to an article comprising a glass sheet and having an etched pattern, and to a process of manufacturing an article comprising a glass sheet and having an etched pattern. The glass sheet 11 is a chemically tempered glass sheet, and the pattern comprises one or more grooves 10 etched into the article using fluorine ions to a depth of less than 2 .mu.m. The etched grooves 10 constituting the pattern may be formed in a layer 12 of inorganic material such as SiO.sub.2. They may have a width of less than 10 .mu.m and the spacing (p) between two adjacent grooves may also be less than 10 .mu.m. The etching may be performed by applying a layer of radiation-sensitive material to at least one face of that sheet and exposing it to radiation to form a latent image of a desired groove pattern, whereafter the radiation-sensitive material is developed to form a resist and the sheet is exposed, through the resist, to the action of fluorine ions in an etching medium to etch the desired groove pattern to a depth of less than 2 .mu.m. The invention is particularly useful for forming storage discs for recording data and also for forming panels of high optical transmittance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.