Light-sensitive composition for positive-type light-sensitive lithographic printing plates
US4797346A · kind A · utility
21Cited by
7References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 13, 1987 |
| Grant date | Jan 10, 1989 |
| Priority date | — |
| Expiry date | May 13, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0236
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A light-sensitive composition for use in the preparation of positive-type light-sensitive lithographic printing plate which comprises an o-naphthoquinone diazide compound and novolak resin in which the novolak resin comprises two different novolak resins each being prepared by the polycondensation or co-polycondensation of an aldehyde with at least one compound selected from the group consisting of phenol, m-cresol, o-cresol and p-cresol.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.