Spin-on glass for use in semiconductor processing
US4798629A · kind A · utility
39Cited by
10References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 22, 1987 |
| Grant date | Jan 17, 1989 |
| Priority date | — |
| Expiry date | Oct 22, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02282
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A spin-on glass consisting of, by volume: 1.0 parts tetraethoxysilane (TEOS, also known as tetraethylorthosilicate), methyltriethoxysilane, and dimethyldiethoxysilane in a 2/1/1 ratio; 1.1 parts ethanol (EtOH, also known as ethyl alcohol); 0.0002 parts hydrochloric acid (HCl); and 0.26 parts water (H.sub.2 O).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.