Silica glass formation process
US4801318A · kind A · utility
16Cited by
6References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 29, 1987 |
| Grant date | Jan 31, 1989 |
| Priority date | — |
| Expiry date | Jan 29, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S65/901
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
In a forming a silica glass at low temperature, a fumed silica is added to a hydrolyzed solution of a metal alcoxide. 0.2-5 mol of fumed silica is added to 1 mol of metal alcoxide. Being uniformly dispersed, the solution is gelled and dried to be dry gel and then sintered to be non-porous. This process allows a practically large sized silica glass to be materialized which has been impossible by the previous sol-gel technology. In addition, a further large silica glass can be prepared by adjusting pH value to 3-6 with addition of base in the sol solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.