Process for producing a pattern with negative-type photosensitive composition
US4801519A · kind A · utility
4Cited by
3References
9Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Apr 13, 1987 |
| Grant date | Jan 31, 1989 |
| Priority date | — |
| Expiry date | Apr 13, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A developing solution comprising at least two compounds selected from choline and quaternary ammonium salts is suitable for developing a negative-type photosensitive resin composition with exposure to a smaller light amount.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.