Plasma processing apparatus and method
US4803405A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 16, 1987 |
| Grant date | Feb 7, 1989 |
| Priority date | — |
| Expiry date | Apr 16, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/3436
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention relates to a plasma processing apparatus capable of obtaining a satisfactory plasma arc and a processing method used by this plasma processing apparatus. The plasma processing apparatus is constructed to vary an electric current or a voltage during start up at a fixed period for a fixed time. The plasma processing apparatus has a plasma power source capable of controlling an electric current or a voltage applied to a plasma torch, and an electrode and a nozzle are communicated by means of an electrification in the plasma torch. In a method for performing a plasma process by a plasma processing apparatus, a mixing gas has a ratio of Hydrogen to Argon in a range from 5 to 20 Vol %, and a frequency of a plasma electric current is controlled in a range from 10 to 30 KHz.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.