X-ray exposure system
US4803712A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 20, 1987 |
| Grant date | Feb 7, 1989 |
| Priority date | — |
| Expiry date | Jan 20, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An X-ray exposure system includes a frame set on the floor; an X-ray source fixedly provided in the central portion of the upper part of the frame; a mask-wafer alignment means comprising a wafer at a fixed distance from a mask, an X-Y table mounted with the wafer holder, a mask holder for holding the mask, and an alignment detecting means for detecting the alignment of the alignment pattern of the mask and that of the wafer; vibration isolators for supporting the mask-wafer alignment means so that vibrations do not propagate to the mask-wafer alignment means; detecting means for detecting the position of the mask-wafer alignment means with respect to three-dimensional directions relative to the X-ray source; an arithmetic means for calculating an exposure error of a dislocation of a mask pattern exposure on the wafer, on the basis of position data obtained by the detecting means; and correcting means for correcting the exposure error calculated by the arithmetic means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.