Apparatus for forming deposited film
US4803947A · kind A · utility
32Cited by
4References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 13, 1987 |
| Grant date | Feb 14, 1989 |
| Priority date | — |
| Expiry date | Jan 13, 2007 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/545
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
There is disclosed an apparatus for forming deposited film which forms deposited film on a substrate by introducing a gaseous starting material for formation of deposited film and a gaseous oxidizing agent having the property of oxidation action for said gaseous starting material through separate routes respectively into a film forming space to thereby effect chemical contact therebetween, comprising one or two or more chambers for formation of deposited film and one or two or more etching chambers for etching at least one of said substrate and the deposited film formed on the substrate connected to one another.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.