Method for etching materials

US4806192A · kind A · utility

Assignee

• Hans Hollmuller Maschinenbau GmbH & Co. · DE

Inventor

• Rainer Haas · Herrenberg, DE

Key dates

• Filing date: Feb 12, 1988
• Grant date: Feb 21, 1989
• Expiry date: Feb 12, 2008

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23F1/16
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

An apparatus for etching supports that have deposited thereon an etchable metal with an etching medium, which apparatus includes an etching chamber, means to convey the supports with metal deposited thereon through the etching chamber, a plurality of nozzles which are positioned to spray etching medium containing acid on the supports as they move through the etching chamber, a sump for receiving residual etching medium withdrawn from the etching chamber, a first circulating system for circulating residual etching medium from the sump back to the plurality of nozzles, a reservoir for an oxidizing agent, a device for regulating the addition of oxidizing agent into the circulating system in an amount which is stoichiometrically in excess of that required to remove metal from the supports, a chamber containing a metal which will react with the oxidizing agent, a second circulating system for circulating residual etching medium from the sump through the chamber containing a metal, a regenerating chamber to receive and regenerate the etching medium leaving the chamber containing a metal, and means to convey the etching medium regenerated in the regenerating chamber back to the sump.