Photographic element and patternable mordant composition
US4808510A · kind A · utility
5Cited by
5References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 20, 1987 |
| Grant date | Feb 28, 1989 |
| Priority date | — |
| Expiry date | Aug 20, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0388
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photographically negative-working patternable mordant composition is disclosed containing a photocrosslinkable polymer comprised of, for providing both mordanting and crosslinking sites, repeating units of the formula: ##STR1## wherein Ar is an aromatic linking group, PA0 R is a methylene group, PA0 R.sup.1 is independently in each occurrence a lower alkyl group, PA0 R.sup.2 is a divalent linking group, PA0 X is a photocrosslinking group, and PA0 Z is a charge balancing counter ion. The mordant composition can be coated on a support to form a photographic element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.