So-called advanced epoxide resins based on cyclohex-1-ylmethylenediphenol derivatives or bicyclo(2.2.1)hept-1-ylmethylenediphenol derivatives
US4808740A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 25, 1988 |
| Grant date | Feb 28, 1989 |
| Priority date | — |
| Expiry date | Jan 25, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G59/3218
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The invention relates to compounds of the formula I or II ##STR1## in which A is a radical ##STR2## R.sup.1 is hydrogen or methyl, R.sup.2 is the radical of an aliphatic, cycloaliphatic, aromatic or araliphatic diol after both of the hydroxyl groups have been removed, R.sup.3, R.sup.4, R.sup.5 and R.sup.6 independently of one another are hydrogen, C.sub.1 -C.sub.6 alkyl, chlorine or bromine, R.sup.7 is a radical of the formula III, IV, V or VI ##STR3## R.sup.8, R.sup.10, R.sup.12 and R.sup.14 are hydrogen, C.sub.1 -C.sub.6 alkyl or phenyl, R.sup.9, R.sup.11, R.sup.13 and R.sup.15 are hydrogen or C.sub.1 -C.sub.6 alkyl and the average value of n (number average) is a number from 1 to 20, it being possible for the radicals R.sup.1 to R.sup.15, within a given molecule, to assume different meanings within the scope of the definitions given. These compounds or also the epoxidized intermediates of the formula X ##STR4## in which R.sup.1 to R.sup.3 are defined above and R.sup.7 is a radical of the formula IV or VI can be processed to give cured products having a high glass transition temperature and a low tendency to discoloration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.