Projection exposure apparatus
US4811055A · kind A · utility
44Cited by
4References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 24, 1988 |
| Grant date | Mar 7, 1989 |
| Priority date | — |
| Expiry date | Jun 24, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70241
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus for projecting a pattern of a mask onto a wafer, wherein the wavelength of light irradiating the mask is made adjustable to change the state of image formation, such as the imaging magnification, focus, etc., with respect to the mask pattern projected onto the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.