Hollow cathode plasma plume
US4812040A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 27, 1987 |
| Grant date | Mar 14, 1989 |
| Priority date | — |
| Expiry date | Mar 27, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/73
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Sample material is sputtered from an orifice in a disc mounted in a hollow cathode. A plasma plume is ejected from the orifice and the material sputtered from the smaple is transported directly into the base of the plasma plume. Collisions with particles in the plasma plume excite the sputtered material. Light emission and absorption from the plume are measured and ions in the plume are measured. A chamber surrounding the plasma plume is maintained at about 1 torr. About 15 cc's per minute of argon are supplied to the hollow cathode at 2 torr. The power supply supplies about 200 volts at about 0.10 amps. Low energy argon ions strick the disc at the end of the cathode tube and sputter atoms off the aperture. Atoms collide with particles in the plasma causing excitation, photon emission and ionization of atoms which are measured by optical and mass spectrometers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.