Measuring surfactant concentration in plating solutions
US4812210A · kind A · utility
25Cited by
11References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 16, 1987 |
| Grant date | Mar 14, 1989 |
| Priority date | — |
| Expiry date | Oct 16, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N27/416
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An arrangement for measuring the concentration of surfactants in a electrolyte containing metal ions includes applying a DC bias voltage and a modulated voltage to a counter electrode. The phase angle between the modulated voltage and the current response to the modulated voltage at a working electrode is correlated to the surfactant concentration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.