Gas mask filter for the removal of low level ethylene oxide contaminants from air comprising dried cationic exchange resins
US4813410A · kind A · utility
1Cited by
5References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 18, 1987 |
| Grant date | Mar 21, 1989 |
| Priority date | — |
| Expiry date | May 18, 2007 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J39/05
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A gas mask filter material is described comprising a dried acidic ion exchange resin which is effective in removing low levels of ethylene oxide from air contaminated therewith. Specifically described is a gas mask filter comprising a cross-linked polystyrene resin with sulfonic acid functionality that contains less than about 20 percent by weight water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.