Water soluble contrast enhancement layer method of forming resist image on semiconductor chip
US4816380A · kind A · utility
7Cited by
7References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 27, 1986 |
| Grant date | Mar 28, 1989 |
| Priority date | — |
| Expiry date | Jun 27, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A water soluble contrast enhancement compound and composition, and a method of use thereof, are disclosed for improving sidewall profiles in photoresist patterning and developing. The compound consists of a 1-oxy-2-diazonaphthalene sulfonamide salt.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.