Poly(silyl silane)homo and copolymers
US4820788A · kind A · utility
35Cited by
8References
31Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 31, 1986 |
| Grant date | Apr 11, 1989 |
| Priority date | — |
| Expiry date | Oct 31, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0754
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.