Silver halide photographic light-sensitive material
US4822727A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 25, 1988 |
| Grant date | Apr 18, 1989 |
| Priority date | — |
| Expiry date | May 25, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/162
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A silver halide photographic light-sensitive material having on a support at least one light-sensitive silver halide emulsion layers and at least one light-insensitive upper layers on the emulsion layer, in which at least one of said light-insensitive upper layers contains a polymer latex having a glass transition point of at least 20.degree. C. and the said at least one light-insensitive upper layer and/or at least one other of said at least one light-insensitive upper layer(s) contains a polymer latex having a glass transition point of lower than 20.degree. C. In the silver halide photographic light-sensitive material, at least one of the light-insensitive upper layers can also have a melting time which is longer than that of the light-sensitive silver halide emulsion layer. The silver halide photographic light-sensitive material has high sticking resistance and improved layer strength under low humidity conditions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.