Reflector apparatus for chemical vapor deposition reactors
US4823735A · kind A · utility
22Cited by
0References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 12, 1987 |
| Grant date | Apr 25, 1989 |
| Priority date | — |
| Expiry date | May 12, 2007 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/481
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A reflector apparatus with multiple reflecting facets for chemical vapor deposition reactors. For vertical and barrel reactors, the facets are annular and fit around the bell-jar shaped process enclosure. The facets may be adjusted by orienting or curving the reflecting facet surfaces so that the radiant energy from the reactor susceptor may be reflected back to the susceptor and wafers as desired for uniform heating of the processed semiconductor wafers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.