Apparatus for coating substrates
US4824545A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 17, 1987 |
| Grant date | Apr 25, 1989 |
| Priority date | — |
| Expiry date | Dec 17, 2007 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/566
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for coating substrates in a vacuum chamber has a cathode system, which is preceded and followed by evacuable isolating chambers. The individual chambers can be separated from one another by locks, and the apparatus has a conduit leading into the coating chamber for feeding one or more process gases. Transport frames carry the substrates through the individual chambers on rails and/or wheels. In such an apparatus one or more bypass lines are provided which connect the coating chamber to the isolating chambers preceding or following it, and a shutoff or valve is inserted into each bypass line and brings about an equalization of pressure between the chambers. By means of a pressure equalization performed in this manner, the constancy of the gas concentrations which is essential in a reactive process to the stability of the process and to uniform coating properties, is automatically assured.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.