Projection exposure apparatus
US4825247A · kind A · utility
69Cited by
5References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 12, 1988 |
| Grant date | Apr 25, 1989 |
| Priority date | — |
| Expiry date | Feb 12, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70883
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus particularly suitable usable for the manufacture of semiconductor microcircuit is disclosed. The apparatus includes a specific arrangement that allows accurate and precise detection of any change in the imaging magnification and/or the image surface position of a projection optical system included in the projection exposure apparatus. Thus, with the present invention, a pattern can be projected upon a workpiece with improved accuracy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.