X-ray exposure apparatus
US4825453A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 17, 1985 |
| Grant date | Apr 25, 1989 |
| Priority date | — |
| Expiry date | Oct 17, 2005 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70866
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is an X-ray exposure apparatus having a low attenuation chamber supplied with a gas absorbing little X-rays, the low attenuation chamber being interposed between an X-ray source and a mask so that X-rays transmitted through the low attenuation chamber are irradiated on the mask so as to transfer a mask pattern onto a resist on a wafer, the apparatus comprising detecting means for detecting the gas or components mixed in the gas in the low attenuation chamber, control means for controlling a quantity of supply of the gas into the low attenuation chamber in accordance with an output signal of the detecting means, and/or adjusting means for adjusting a quantity of exposure of said X-rays irradiated on the mask in accordance with an output signal of the detecting means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.