Film forming apparatus
US4825806A · kind A · utility
18Cited by
1References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 17, 1987 |
| Grant date | May 2, 1989 |
| Priority date | — |
| Expiry date | Jul 17, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32532
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A process for forming a film, characterized in that, in forming a film by glow discharge decomposition, one or more electrode pair rows each consisting of a plurality of high frequency electrode pairs are arranged in a line and in parallel and substrates are arranged on both sides of said electrode pair row approximately in parallel to the electrode pair row. According to the process, damage of the film due to plasma can be reduced, a shield on the back of the RF electrode is not needed, and a film of a large area can be obtained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.