Devices involving silicon glasses
US4826709A · kind A · utility
13Cited by
2References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 29, 1988 |
| Grant date | May 2, 1989 |
| Priority date | — |
| Expiry date | Feb 29, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02318
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A sol-gel process is utilized for producing silicon oxide glasses useful in the manufacture of devices such as semiconductor devices. These glasses are easily deposited by techniques such as spinning. Not only is the glass easily applied, but also has advantageous electrical, etching, and mechanical properties. Thus, these glasses are useful in applications such as passivating layers for integrated circuit devices and as intermediary layers in trilevel lithography for the production of such devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.