Soft vacuum electron beam patterning apparatus and process
US4827137A · kind A · utility
8Cited by
4References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 28, 1986 |
| Grant date | May 2, 1989 |
| Priority date | — |
| Expiry date | Apr 28, 2006 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31788
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A cold cathode glow discharge electron gun operating in the abnormal glow region produces a wide area collimated electron beam employed for flood exposure of thin film materials through electron beam transmission masks, resulting in spatially localized exposure and patterning of the thin film materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.