Filled grid mask
US4827138A · kind A · utility
9Cited by
2References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 26, 1988 |
| Grant date | May 2, 1989 |
| Priority date | — |
| Expiry date | Feb 26, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask (38), which is particularly useful in parallel-printing ion beam lithography because of its dimensional stability, is disclosed. The mask (38) represents a relatively rigid screen (22) constructed from a relatively rigid material, such as monocrystalline silicon, with meshes (28) formed through the screen (22) over the entire area of the screen (22). The preferred embodiment applies a less rigid filler material (34) into the meshes (28) over the entire area of the screen (22), then removes the filler material (34) from transmissive areas (42) of the mask (38).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.