Apparatus for applying multilayer optical interference coating on complex curved substrates
US4827870A · kind A · utility
21Cited by
7References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 5, 1987 |
| Grant date | May 9, 1989 |
| Priority date | — |
| Expiry date | Oct 5, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/287
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Precision multilayer optical interference coating of substrates having complex topology using complementary shaped electrodes and plasma enhanced chemical vapor deposition within a chamber. The materials for the optical quality thin films are obtained from starting reactants of the form M-R where M denotes a metal atom and R denotes an organic component. These starting reactants are brought into a reactive atmosphere of the chamber through a plurality of orifices in one of the shaped electrodes. The resulting substances are deposited as thin films upon the substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.