Solvent composition for cleaning silicon wafers
US4828751A · kind A · utility
31Cited by
5References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 28, 1987 |
| Grant date | May 9, 1989 |
| Priority date | — |
| Expiry date | Aug 28, 2007 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D7/5018
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
There is provided an improved solvent especially adapted for cleaning silicon wafers and consisting essentially of a haloalkylhydrocarbon and a partially fluorinated alcohol. This solvent provides excellent cleaning and drying of the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.