Processing apparatus
US4832779A · kind A · utility
25Cited by
19References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 26, 1988 |
| Grant date | May 23, 1989 |
| Priority date | — |
| Expiry date | Apr 26, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A rapid thermal processing apparatus and method wherein a transparent (e.g. quartz) vacuum wall is sealed to the process chamber by a radially elastically expandable metallic seal, e.g. a hollow metallic ring with a spring in its core, which has a soft surface portion which deforms inelastically to make a seal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.