Plasma production of trichorosilane, SiHCl.sub.3
US4836997A · kind A · utility
21Cited by
5References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 25, 1983 |
| Grant date | Jun 6, 1989 |
| Priority date | — |
| Expiry date | Jul 25, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S423/10
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Trichlorosilane, SiHCl.sub.3, is facilely prepared by (i) thermally reducing silicon tetrachloride, SiCl.sub.4, with hydrogen to produce reaction admixture comprising SiHCl.sub.3 and hydrochloric acid, said thermal reduction being carried out in a thermal plasma while tempering the reaction medium with a cooling gas, (ii) reacting said step (i) reaction admixture with elemental silicon at a temperature of from about 250.degree. to 350.degree. C. to produce SiHCl.sub.3 and hydrogen therefrom, and thence (iii) separating (iiia) the plasma-creating, hydrogen and cooling gases, and (iiib) product silicon chlorides therefrom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.