Optical disk manufacturing method
US4837130A · kind A · utility
15Cited by
3References
6Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Aug 27, 1987 |
| Grant date | Jun 6, 1989 |
| Priority date | — |
| Expiry date | Aug 27, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
In an optical disk manufacturing method in which a first photo resist layer, an intermediate resin layer, and a second photo resist layer are formed on a substrate in the stated order, a resin solution which is unsoluble in organic solvent is applied to the first photo resist layer, heated, and hardened to form the intermediate resin layer. Thereby the use of a large, expensive device such as a vacuum deposition device or sputting device is eliminated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.