Thermally developable light-sensitive material containing a development restrainer compound
US4837141A · kind A · utility
34Cited by
7References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 3, 1988 |
| Grant date | Jun 6, 1989 |
| Priority date | — |
| Expiry date | May 3, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/158
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A thermally developable light-sensitive material is disclosed that the said material has at least one light-sensitive silver halide containing layer on a support and which further contains a compound represented by the general formula (I): EQU X (J.sub.m F).sub.n (I) wherein X is the residue of the development restrainer; J is a divalent linkage; F is an immobilizing group that is capable of reducing the diffusibility of the compound of formula (I) or a silver salt or silver complex thereof during thermal development; m is 0 or 1; and n is an integer of 1 to 3.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.