Patent · US Expired

High-gain photodetectors made from NIPI mesas with selective lateral contacts

US4839714A · kind A · utility

9Cited by
3References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 14, 1988
Grant dateJun 13, 1989
Priority date
Expiry dateMar 14, 2008

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A selective contact to a NIPI doping superlattice having a trap free (or low trap density) contact in contact with the layers of the superlattice. In a NIPI superlattice, the trap free region is a doped region that can be produced: by diffusion of dopant ions from a doped metal contact; by overdoping of the edges of the superlattice; or by overgrowth of the edges of the superlattice with a doped material that is trap free.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.