Inorganic polysilazane and method of producing the same
US4840778A · kind A · utility
17Cited by
7References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 26, 1985 |
| Grant date | Jun 20, 1989 |
| Priority date | — |
| Expiry date | Nov 26, 2005 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2004/10
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Novel primarily chain inorganic polysilazanes of average molecular weight of 690 to 2000 are prepared from novel adducts of a halosilane and a base by reacting the adducts with ammonia in unreactive solvents. Silicon nitride is prepared by heating the polysilazanes at 1000.degree. to 1600.degree. C., preferably below 1300.degree. C., most preferably 1000.degree. to 1100.degree. C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.