Apparatus for treating photoresists
US4841342A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 12, 1988 |
| Grant date | Jun 20, 1989 |
| Priority date | — |
| Expiry date | May 12, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2024
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Ultraviolet radiation process applicable in the manufacture of semiconductor devices to enhance the thermal stability of a photoresist film on a semiconductor wafer. A method, in ultraviolet radiation process, and an apparatus enabling the high-speed and effective treatment of a photoresist pattern employing ultraviolet irradiation by preventing the deformation of the photoresist which is caused by the light radiated from a discharge lamp such as high pressure mercury vapor lamp. This method and apparatus employ ultraviolet irradiation, in which ultraviolet rays are applied to the photoresist pattern, using a means to intercept or reduce selectively all or part of the wavelengths in the spectral response region of the photoresist out of radiant energy obtained from the discharge lamp.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.