Method of manufacturing molds for molding optical glass elements and diffraction gratings
US4842633A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 23, 1988 |
| Grant date | Jun 27, 1989 |
| Priority date | — |
| Expiry date | Aug 23, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S359/90
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A base material excellent in heat resistance and high-temperature strength is processed into a desired configuration. The processed base material is coated with a heat-resistant film having excellent strength at high temperatures and low reactivity with a glass material to be molded. A resist is applied on the heat resistant film and a desired pattern is drawn thereon by means of electron beam, ion beam, hologram exposure, or ordinary photolithography. Or if a mold having deep unevenness of the pressing surface is required, the resist is applied after an intermediate layer which permits selective etching is formed on the heat resistant film, and the required pattern is drawn thereon by means of electron beam, ion beam, hologram exposure, or ordinary photolithography. The intermediate layer is removed by wet etching or dry etching to emphasize unevenness of the mask. The resist film or the resist film and intermediate layer film are completely removed and a part of the heat-resistant film is removed to obtain a mold having the desired configuration of the molding surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.