Magnetron deposition of ceramic oxide-superconductor thin films
US4842704A · kind A · utility
Inventors
Key dates
| Filing date | Jul 29, 1987 |
| Grant date | Jun 27, 1989 |
| Priority date | — |
| Expiry date | Jul 29, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/816
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for depositing and tailoring anisotropic properties of ceramic oxide superconductive films onto the outer surface of fibers, wires, rods, bars and onto the inner surface of tubes, as well as onto the surface of disc-shaped substrates, employs either tandem magnetron discharges alone or both an abnormal glow cold cathode electron gun together with tandem magnetron discharges. This deposition method provides uniform thin films having high growth rates, controllable stoichiometry and desired anisotropic microstructure. The magnetron cathodes are made from either mixtures or single elements of the metals. The oxygen component is achieved either from the cathode material itself or by reactive sputtering in an oxygen ambient or a post-deposition thermal or plasma oxidation. An external electron beam may also be used for in-situ annealing of the deposited films while placed under an external applied magnetic field to better align crystals in the films for the desired anisotropic superconducting properties. Thin metal or dielectric thin films are deposited as an interface layer and are placed both on the top of and under the metal oxide ceramic superconductive film material. Herme…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.