Method of making mixed nitride films with at least two metals

US4842710A · kind A · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventors

• Helmut Freller · Westerburg, DE
• Peter Schack · Nuremberg, DE

Key dates

• Filing date: Mar 9, 1988
• Grant date: Jun 27, 1989
• Expiry date: Mar 9, 2008

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/0641
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

In particular for coating tools and product components, which are subject to extremely high wear, metal nitride films are used. It has been found that if the metals have markedly different melting points, in accordance with the invention, the concentrations of the metals can be varied as a function of the film thickness. For manufacturing such mixed nitride films by vaporization of metal alloy cathodes by means of an arc while simultaneously introducing nitrogen as reaction gas, a variable voltage is applied to the substrate during vaporization of the metal alloy and varied as a function of the film thickness on the substrate.