Patent · US Expired

Aftertreatment of relief plates using solution comprising a carboxylic acid and a bromide

US4845013A · kind A · utility

1Cited by
8References
4Claims
0Family size

Assignee

Inventor

Key dates

Filing dateNov 28, 1988
Grant dateJul 4, 1989
Priority date
Expiry dateNov 28, 2008

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/405
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Relief plates which are produced by imagewise photopolymerization of layers which contain, as binders, block copolymers of conjugated dienes and vinylaromatics are aftertreated with an aqueous solution of a mixture of bromates, bromides and acids by a process in which amidosulfonic acid and/or aliphatic di-, tri- and/or tetracarboxylic acids are used as the acids.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.