Aftertreatment of relief plates using solution comprising a carboxylic acid and a bromide
US4845013A · kind A · utility
1Cited by
8References
4Claims
0Family size
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Key dates
| Filing date | Nov 28, 1988 |
| Grant date | Jul 4, 1989 |
| Priority date | — |
| Expiry date | Nov 28, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/405
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Relief plates which are produced by imagewise photopolymerization of layers which contain, as binders, block copolymers of conjugated dienes and vinylaromatics are aftertreated with an aqueous solution of a mixture of bromates, bromides and acids by a process in which amidosulfonic acid and/or aliphatic di-, tri- and/or tetracarboxylic acids are used as the acids.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.