Multilayer ceramics coatings from the ceramification of hydrogen silsequioxane resin in the presence of ammonia
US4847162A · kind A · utility
70Cited by
1References
28Claims
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Assignee
Inventors
Key dates
| Filing date | Dec 28, 1987 |
| Grant date | Jul 11, 1989 |
| Priority date | — |
| Expiry date | Dec 28, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Hydrogen silsesquioxane resin can be ceramified at low temperature in the presence of ammonia, with or without platinum or rhodium catalysis, to form a ceramic coating on the surface of a substrate. The nitrified silica coatings produced are useful as interlevel dielectric films or for planarizing and protecting the surface of electronic devices. For further surface protection, overcoating the nitrided silica with an additional layer of a passivating ceramic material and a top layer of a barrier ceramic material is also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.