Method of making reaction bonded/hot pressed Si.sub.3 N.sub.4 for use as a cutting tool
US4848984A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 20, 1984 |
| Grant date | Jul 18, 1989 |
| Priority date | — |
| Expiry date | Sep 20, 2004 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC04B35/593
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of making a reaction bonded/hot pressed silicon nitride comprising object is disclosed. Second phase crystallites are formed prior to hot pressing. A mixture of silicon, SiO.sub.2, and 0.4-2.3 molar percent (by weight of the silicon) of oxygen carrying agents, i.e., Y.sub.2 O.sub.3 and Al.sub.2 O.sub.3, is performed and reaction nitrided to form discs or billets having at least 60% alpha Si.sub.3 N.sub.4 and a high proportion of second phase crystallites which displace substantially all silicate glass except for a controlled small quantity. The reactive amounts of Y.sub.2 O.sub.3, Al.sub.2 O.sub.3 and SiO.sub.2 are controlled to assure formation of substantially Y.sub.1 SiO.sub.2 N as the second phase crystallite. Al.sub.2 O.sub.3 is controlled in an amount of 0.4-4% by weight to ensure that the small proportion of glass serves to protect the oxynitrides against linear oxidation kinetics. The hot pressed material has no visual mottle porosity associated therewith.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.