Method for modifying the surface of finely divided silica
US4849022A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 11, 1988 |
| Grant date | Jul 18, 1989 |
| Priority date | — |
| Expiry date | Oct 11, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2006/82
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
In the present invention, finely divided silica is treated with two types of organosilican compounds, PA0 (i) organosilicon compound having the general formula ##STR1## wherein R is a monovalent hydrocarbon group; n is an integer having a value of 0 to 10; and Q is an alkoxy group, halogen atom, or hydroxyl group, and PA0 (ii) organosilicon compound having the general formula EQU (R.sub.3 Si).sub.a --Z PA0 wherein R is a monovalent hydrocarbon group; a is 1 or 2; when a equals 1, Z is a hydrogen atom, halogen atom, hydroxyl group, alkoxy group, --NR.sup.1.sub.2, --ONR.sup.1.sub.2, or --OCOR.sup.1 ; when a equals 2, Z is --O--or --NR.sup.1 --; and R.sup.1 is the hydrogen atom or an alkyl group. The present invention characteristically affords a finely divided silica which has a high degree of surface treatment, which provides an elevated thixotropy when mixed with organopolysiloxane, and which provides stability in long-term storage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.