Apparatus and method for manufacturing photosensitive amorphous silicon objects
US4851256A · kind A · utility
9Cited by
4References
9Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 9, 1987 |
| Grant date | Jul 25, 1989 |
| Priority date | — |
| Expiry date | Dec 9, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for manufacturing photosensitive amorphous silicon objects comprises a pair of coaxial cylindrical electrodes inside a reaction tank of a plasma CVD device. A plurality of cylindrical substrates of an electrically conductive material disposed between these electrodes. A source gas is injected into the reaction tank through a plurality of inlets evenly spaced on the outer peripheral wall so that films of uniform quality can be produced efficiently.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.