Compensated scan wave form generator for ion implantation equipment
US4851693A · kind A · utility
14Cited by
6References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 3, 1988 |
| Grant date | Jul 25, 1989 |
| Priority date | — |
| Expiry date | Jun 3, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3171
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A scan controller for an ion implantation system includes a compensation circuit for generating a scanning signal from a triangle voltage signal. The scanning signal causes an ion beam to be deflected so that, in the variety of geometries describing the orientation of the target in the implantation system, the position of the intersection of the ion beam with the planar target surface changes linearly with time. In one embodiment the scanning signal has the form v(t)=-d -e/(t+c). In other embodiments the compensation circuit approximates the above function by means of polynomials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.