Photopatterned product of silicone polyamic acid on a transparent substrate
US4855199A · kind A · utility
28Cited by
7References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 8, 1988 |
| Grant date | Aug 8, 1989 |
| Priority date | — |
| Expiry date | Aug 8, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0007
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Photopatternable silicone polyamic acid can be spun onto a substrate and thereafter used in combination with a photoresist as an antireflective coating or as a patterned silicone polyimide. The silicone polyamic acid can be used with an absorbing dye, or it can be tinted with an organic dye to provide color filters when applied on a transparent substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.