Light source for reduced projection
US4856018A · kind A · utility
63Cited by
3References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 20, 1987 |
| Grant date | Aug 8, 1989 |
| Priority date | — |
| Expiry date | Jan 20, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2256
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reduced projection light source comprises a laser device for emitting laser light having a transverse mode of multimodes, and an etalon located between a chamber of the laser device and a total reflection mirror. The light source is used as an exposure light source for transfer printing an ultrafine pattern on a semiconductor wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.